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Research
Research Group Professor Research Fields
Advanced Energy Materials Lab

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Prof. Myoungho Pyo - Design and validation of new structure active materials, with improved safety for Li and Na ion batteries
- Development of carbonaceous anode materials for high Li and Na storage
- Development of new functional electrode materials for flexible devices
Printed IC Lab.

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Prof. Gyoujin Cho RFID Tag - Printed rectenna, Printed digital processor, 13.56MHz RFID tag (1bit,4bit,16bit,32bit, 96bit)
Electronic ink formulation - Conducting ink, Dielectric ink, Semiconducting ink
Fabrication of Printed device - Smart packaging, Wireless cyclic voltammetry tag, TFT-Backplane Sensor array
Micromechanics & Micro structure Control Lab.

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Prof. Shi-Hoon Choi Multiscale Modeling and Simulation
- Analysis of physical properties for structural material and printed flexible device using ab-initio & MD
- Analysis of micromechanical behaviors for structural material and printed flexible device using crystal plasticity finite element method(CP-FEM)
- Optimization of process conditions for structural material and printed flexible device using FEM
Microstructure Characterization
- Analysis of microstructure and microtexture in structural material and printed flexible device
- A study for primary recrystallization and grain growth in structural materials
- Development of phase identification technique for multi-phase steels using IQ & KAM
Information & Opto Electronics Materials Lab.

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Prof. Joon Seop Kwak GaN based optical device (LEDs, LDs)
- Improved lateral, flip, vertical chip design & fabrication
- Improved unit process research
- DC imposed RF sputter for TCO
- Magnetron Sputtering for reflector such DBR, Ag
- Elucidation of the mechanism for reliability of electrode
Optical & Thermal & Package Simulation
- Optics design for LED lightings
- Thermal design for LED chip, package, and lightings
GaN based power device (HFETs)
- Surface pre-treatment & passivation by energetic particle beam
- M2/M3 level chip design & fabrication with flexible IMD
Nanomaterials & Device Lab.

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Prof. Ji-Myon Lee Processing of GaN-based LEDs and LDs
- Plasma etching (N-polar/nonpolar/semipolar) - Metallization Materials processing of ZnO
- Etching (dry/wet)
- Metallization (ohmic/Schottky contact)
Top-down fabrication of nanostructures
- Photonic crystals (by laser holography)
- S/C nanostructure (by metal dewetting)
Bottom-up fabrication of nanostructure
- Si semiconductor Nanowire (Si by PECVD)
- Graphene growth (TCVD)
TCOs
- H2 plasma treatment (R2R deposited ITO/PET, spin-coated ITZO, Ti-doped InOx
- Ohmic contact
- Wet/dry etching
- Graphene/TCO hybridization process